admin 管理员组文章数量: 1184232
2024年12月27日发(作者:windows正版系统多少钱)
Growth of SiC Nanorods on Si Substrate
Abstract
Silicon carbide (SiC) is a ™-™ compound semiconductor material
with a wide band gap. Semiconductor electronic devices and circuits
made from SiC are presently being developed for high-temperature,
high-power, and high-radiation conditions in which conventional
semiconductors cannot adequately perform. One-dimensional SiC, such
as nanowires and nanorods, is of great interests for many applications due
to their excellent properties, such as high mechanical strength, high
thermal stability, high thermal conductivity. Especially SiC nanorods are
widely considered as reinforcement materials for ceramic composites
providing very high strength and toughness due to their very high elastic
modulus and strength over their bulk-counterpart. In this study, the SiC
nanorods were fabricated by vapor-liquid-solid (VLS) mechanism on Si
substrate. The SiC nanaorods were characterized by scanning electron
microscopy (SEM), X-ray diffraction (XRD)
and energy diffraction
spectrometer (EDS).The factors which influenced the formation of SiC
nanorods were studied.
Keywords: SiC nanorods, VLS mechanism, CVD
Introduction
Silicon carbide (SiC) is a wide band gap semiconductor with many
super properties, such as high breakdown field,high thermal conductivity,
high saturation drift velocity, low relative dielectric constant and
excellent resistance to oxidation and corrosion
[1-2]
. These outstanding
properties make SiC a very attractive semiconductor material. For
example, SiC is commercially applied for optoelectronic devices
[3]
, such
as photodiodes and light-emitting diodes which emit throughout the
visible spectrum into the ultraviolet. The applications of SiC also cover
the area of high-temperature sensors, high-power devices, and microwave
devices (both avalanche diodes and field effect transistors).
In the meantime, since carbon nanotubes emerged into the scientific
world in 1991 and their exceptional excellent properties were introduced,
one-dimensional nanomaterials such as SiC, GaN, have attracted much
interest from researchers because the extreme geometry of the
nanomaterials is of importance to investigate the physical and chemical
properties of the materials such as their quantum size effect. These
nanosized materials are important for ceramic nanocomposite materials
[4,
5]
. They are also claimed to be promising raw materials for engineering
ceramic devices offering superplasticity and high strength at high
temperatures. Furthermore nanoscale filters or support for a catalytic
surface might be interesting application of SiC nanopowders.
2
A lot of methods have been developed to synthesize SiC nanorods
[6]
.
SiC nanorods can be fabricated without the metallic catalysts. For
instance, Zhou
[7]
fabricated SiC nanowires by the hot filament chemical
vapor deposition (CVD) method. B.-C. Kang synthesized SiC nanorods
by CVD method. Li
[8]
synthesized SiC nanowires by using a SiC rod as
the anode to arc-discharge. And Hyung Suk Ahn
[9]
synthesized SiC
nanorods by using LPCVD. SiC nanorods can be also fabricated with the
metallic catalysts. For example, B.-C. Kang fabricated SiC nanorods by
using nickel as a catalyst. And Zhang
[10]
et al. synthesized SiC nanorods
using Fe powders as the catalyst. Among these methods, carbothermal
reduction of silica-containing materials and the CVD method are the most
commonly employed.
In carbonthermal reduction process, three mechanisms are involved
to form SiC nanorods. They are called vapor-solid (VS) mechanism,
two-stage growth (TS) mechanism and vapor-liquid-solid (VLS)
mechanism.
[11]
By the VS mechanism, the nanorods are grown by direct
accommodation of silicon and carbon atoms to the growth plane from the
silicon- and carbon-carrying vapors. The nanorods are formed in the raw
materials containing metal impurities such as rice-hulls by the TS
mechanism. The impurities form discrete liquid droplets on the growth
plane. The droplets are quickly covered with vapor species because of
their high accommodation coefficient and act as nucleation sites for the
3
nanorods growth. It results in axial growth of nanaorods (first stage), and,
then in lateral thickening (second stage)
[11, 12]
. The essential features of
VLS mechanism can be expressed as the growth of nanorods via the
assistance of liquid solution containing the desired ingredient of the
nanorods to be grown. The processes are complex and the fundamental
issues remain to be ascertained. The growth of nanorods involves the
dissolution of solute at the vapor/liquid interface and its subsequent
precipitate at the liquid/solid interface during the VLS growth process. In
this paper, nickel was used as a metallic catalyst to deposit SiC nanorods
on Si substrate via the VLS mechanism.
Experiment
SiC nanorods were fabricated in metalorganic chemical vapor
deposition (MOCVD) system. The water-cooled reactor, as shown in
Fig. 1 schematic configuration of MOCVD reactor
4
Fig.1, was a horizontal quartz tube. First, nickel thin film with thickness
of 400∗500 nm, which acted as a catalyst in growing SiC nanorods, was
deposited on Si substrate by DC sputtering. The Si substrates covered
with nickel thin flim were set on a SiC-coated graphite susceptor, which
was heated by ratio frequency (RF) induction. According to Ni-Si and
Ni-C phasediagram
[13-15]
, the growth temperature was selected between
1250ε and 1380ε . Silane (SiH
4
) and acetylene (C
2
H
2
) were used as
source gas. Hydrogen (H
2
) gas purified by a Pd purifier was used as the
carrier gas. The flow rate of H
2
was fixed to be 500 sccm (standard cubic
centimeter per minute). And the growth pressure of SiC nanorods was
fixed to be 60 Torr.
Two processes were carried out to synthesize SiC nanorods. One
was called two-step process, in which only C
2
H
2
was first introduced into
the reactor to fabricate carbon nanotubes on the Si substrates covered
nickel thin film at 1150ε for several minutes. Then the growth
temperature increased to 1150ε ∗1350ε , and C
2
H
2
and SiH
4
were reacted
as the source gas to synthesize SiC nanorods. Another process was called
one-step process, in which C
2
H
2
and SiH
4
as the source gases were
introduced into the reactor at the same time.
The crystal structure of SiC nanorods was characterized by X-ray
diffraction (XRD). The morphology of SiC nanorods was characterized
by scanning electron microscopy (SEM). Energy dispersive spectrometer
5
(EDS) was carried out to identify their chemical composition.
Results and discussion
nanorods synthesized by two-step process
By the two-step process, carbon nanotubes were first synthesized on
the Si substrate in the carbonized process. The morphology and the
composition characterized by SEM and EDS, were shown in Fig.2 and
Fig.3 respectly. The Ag peak appeared in the EDS image was introduced
in the experiment during the SEM and EDS analysis. According to the
figure, high density of carbon nanotubes was grown on the Si substrate.
Fig. 2 SEM images of carbon naotubes grown on a Si substrate
Fig. 3 EDS spectrum of carbon nanotubes
grown on a Si substrate
6
The XRD spectrum of SiC nanorods synthesized by two-step process was
shown in Fig.4. In the XRD patterns, characteristic peaks from (111),
(200) and (220) plane of ß-SiC appeared at 35.68°, 47.68° and 60.16°,
respectively. Peaks from other polytypes of SiC were not observed, so the
SiC nanorods were zinc-blende structure. The morphology of SiC
nanorods was depicted in Fig.5. High density of nanorods was randomly
grown on the substrate. The diameters of SiC nanorods were almost the
same.
2. SiC nanorods synthesized by one-step process
The characters of the SiC nanorods fabricated by one-step process
were characterized by XRD, SEM and EDS. The results are shown in
Fig.6∗8 and table 1. In general, SiC nanorods were synthesized by
one-step process.
Fig. 4 XRD patterns of SiC nanorods
fabricated by two-step method
Fig. 5 SEM image of SiC nanorods
synthesized by two-step method
7
Although all the samples were growth by VLS mechanism, it was
clearly that the diameter of the SiC nanorods fabricated by one-step
process was much larger than that prepared by two-step process. The
reasons should be the confinement effect of carbon nanotubes in two-step
process. The size of carbon nanotubs limited the lateral growth of SiC
nanorods and led to the diameter of SiC nanorods almost the same as that
of carbon nanotubes. For the one-step process, however the main factors
which determined the diameter of SiC nanorods should be the volume of
liquid droplet and wetting behavior
[16-17]
, so the diameter of SiC nanorods,
Fig. 6 XRD pattern of SiC nanorods
fabricatedby one-step process
Fig. 7 SEM image of SiC nanorods
fabricated by one-step process
Table 1: the content of SiC nanorods
fabricated by one-step process
ElementWeight% Atomic%
C K 55.16 69.63
O K 18.36 17.39
Si K 22.34 12.06
Ni K 2.89 0.75
Ag L 1.25 0.18
Totals 100.00
Fig.8 EDS spectrum of SiC
nanorods by one-step process
8
was much larger.
The atomic content of carbon was higher than that of silicon for the
SiC nanorods made by one-step process as shown in table 1. It should be
originate from the result of C
2
H
2
activity. Because of its high activity,
C
2
H
2
should be decomposed very quickly at 1250ε . A lot of carbon
atoms deposited on Si substrate. However, not enough silicon atoms
reacted with them. So the redundant carbon atoms formed amorphous
carbon on the substrate.
Summary
SiC nanorods were successfully synthesized via VLS mechanism by
two-step process and one-step process. The structure, morphology and
composition were characterized by XRD, SEM and EDS. Factors which
affected the diameter of SiC nanorods were discussed.
9
References
[1].
Philip G. Neudeck, SiC technology (1998).
[2].
Philip G. Neudeck, High-temperature electronics –a role for wide bandgap
semiconductors, Proceedings of the IEEE, Vol 90, No 6 (2004).
[3].
Han-Kyu Seong, Heon-Jin Choi and Sang-Kwon Lee, Optical and electrical
transport properties in silicon carbide nanowires, Applied Physics Letters, Vol
85,No 7 (2004).
[4].
B.-C. Kang*, S.-B. Lee, J.-H. Boo*, Growth of ß -SiC nanowires on Si(100)
substrates by MOCVD using nickel as a catalyst, Thin Solid Films 464–465 (2004)
215– 219
[5].
Heon-Jin Choia,*, Han-Kyu Seonga, Jung-Chul Leeb, Yun-Mo Sungb, Growth
and modulation of silicon carbide nanowires, Journal of Crystal Growth 269 (2004)
472–478
[6].
Qingyi Lu, Junqing Hu, Kaibin Tang,a) and Yitai Qian, Growth of SiC nanorods
at low temperature, Appl. Phys. Lett VOL 75, No 4,
[7].
X.T. Zhou, N. Wang, H.L. Lai, H.Y. Peng, I. Bello, N.B. Wang, C.S. Lee, S.T.
Lee, Appl. Phys. Lett. 74 (1999) 3942.
[8].
Y.B. Li, S.S. Xie, X.P. Zou, D.S. Tang, Z.Q. Liu, W.Y. Zhou, , J. Cryst.
Growth 223 (2001) 125.
[9].
Hyung Suk Ahn, Doo Jin Choi, Fabrication of silicon carbide whiskers and
whisker-containing composite coatings without using a metallic catalyst, Surface
and Coatings Technology 154 (2002) 276-281.
[10].
Yingjun Zhang, Nanlin Wang et al, synthesis of SiC nanorods using floating
catalyst, Solid state communications 118(2001)595-598
[11].
Heon-Jin Choi *, June-Gunn Lee, Stacking faults in silicon carbide whiskers,
Ceramics International 26 (2000) 7-12
[12].
R.S. Wagner, W.C. Ellis, Appl. Phys. Lett. 4 (5) (1964) 89.
[13].
C. Rado, et al, wetting and bonding of Ni±Si alloys on Silicon, Acta mater. Vol.
47, No. 2, pp. 461-473, 1999
[14].
J. Acker*, K. Bohmhammel, Optimization of thermodynamic data of the Ni±Si
system, Thermochimica Acta 337 (1999) 187-193
[15].
Hee Jin Jeong , Seung Yol Jeong ,Young Min Shin , Dual-catalyst growth of
vertically aligned carbon nanotubes at low temperature in thermal chemical vapor
deposition, Chemical Physics Letters 361 (2002) 189–195
[16].
Ing-Chi Leu*, Min-Hsiung Hon, Nucleation behavior of silicon carbide whiskers
grown by chemical vapor deposition, Journal of Crystal Growth 236 (2002)
171–175
[17].
Ing-Chi Leu, et al Factors determining the diameter of silicon carbide whiskers
prepared by chemical vapor deposition, Materials chemistry and physics
56(1998),256-561.
10
版权声明:本文标题:材料表征论文-GrowthofSiCNanorodsonSiSubstrate 内容由网友自发贡献,该文观点仅代表作者本人, 转载请联系作者并注明出处:http://www.roclinux.cn/p/1735325568a1648396.html, 本站仅提供信息存储空间服务,不拥有所有权,不承担相关法律责任。如发现本站有涉嫌抄袭侵权/违法违规的内容,一经查实,本站将立刻删除。
发表评论