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2024年12月27日发(作者：java语言流程控制结构)

专利内容由知识产权出版社提供

专利名称：Plasma probe

发明人：Guy T. Blalock

申请号：US11190437

申请日：20050727

公开号：US07129724B2

公开日：20061031

专利附图：

摘要：A plasma probe includes a substrate having substantially the same properties

as those of a substrate to be processed, a bottom electrode layer located over the

substrate and electrically isolated therefrom, a dielectric layer positioned over the

bottom electrode layer including apertures through which one or more electrodes of the

bottom electrode layer are exposed, and at least one upper electrode layer electrically

isolated from the bottom electrode layer by way of the dielectric layer. Electrodes of the

bottom and upper electrode layers may communicate with meters which may provide

real-time data representative of one or more properties of a region of a plasma to which

the electrodes are exposed. The plasma probe may be fabricated by forming the bottom

electrode layer over the substrate and separately forming one or more upper electrode

layers over a sacrificial substrate. These structures are assembled with the dielectric layer

therebetween.

申请人：Guy T. Blalock

地址：Boise ID US

国籍：US

代理机构：TraskBritt

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