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2024年12月27日发(作者：splitter和coupler区别)

专利内容由知识产权出版社提供

专利名称：Rotary developing unit of the board

发明人：北川 勝,奥田 誠一郎

申请号：JP実願平3-113861

申请日：19911227

公开号：JP実開平5-57839U

公开日：19930730

专利附图：

摘要： (57) [summary] [purpose] it is possible to prevent the adhesion developer mist

on the surface of the substrate as much as possible, to improve the quality of the

substrate. [Configuration] The spin chuck 2 to be rotated by substantially horizontally

holding the substrate 1, a nozzle 8 for supplying a developing solution to a substrate 1

which is held by the spin chuck 2, the upper cylinder separable into upper and lower

covers 14 It consists of a skirt spread shaped lower cylinder cover 15. and, shatterproof

cover 1 to coalesce so as to surround the substrate 1 during the rotation processing of

the substrate 1 3, is provided so as to surround the scattering prevention cover 13

constitute a rotary developing apparatus by the outer container 20 for collecting the

processing liquid. Of the bottom wall 20a of the outer container 20, the enclosure in the

region of the scattering prevention cover 13, and opening the exhaust outlet 23a, and

communicates with the negative pressure exhaust passages 23. The lower end of the

lower cylinder cover 15, to form an exhaust guide plate 15c to be a smaller diameter

toward the lower side. The exhaust guide plate 15c Is stationary during the scattering

prevention cover 13 and the outer container 20, effectively to flow down the air, including

the developer mist.

申请人：大日本スクリーン製造株式会社

地址：京都府京都市上京区堀川通寺之内上る4丁目天神北町1番地の1

国籍：JP

代理人：北谷 寿一

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