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2024年12月27日发(作者：resizeme手机版)

专利内容由知识产权出版社提供

专利名称：SUBSTRATE HOLDER SYSTEM WITH

SUBSTRATE EXTENSION APPARATUS AND

ASSOCIATED METHOD

发明人：OLGADO, Donald J., K.,LAKSHMIKANTHAN,

Jayant

申请号：US2002001468

申请日：20020117

公开号：WO02/064861P1

公开日：20020822

摘要：An apparatus and associated method that removes electrolyte solution from a

substrate, the apparatus comprises a thrust plate and a substrate extension unit. The

thrust plate at least partially defines a spin recess. The substrate extension unit can be

displaced between a retracted position and an extended position relative to the spin

recess. The substrate extension unit is disposed within the spin recess when positioned in

the retracted position. The substrate extension unit at least partially extends from within

the spin recess when positioned in the extended position. The substrate is processed by

immersing at least a portion of the substrate in a wet solution. The substrate is removed

from the wet solution. The substrate extension unit extends into its extended position,

and the substrate is spun. Extending the substrate extension unit limits the formation of

fluid traps within the substrate holder assembly or between the substrate and the

substrate holder assembly.

申请人：APPLIED MATERIALS, INC.

地址：3050 Bowers Avenue Santa Clara, CA 95054 US

国籍：US

代理机构：PATTERSON, William B.

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