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2024年12月27日发(作者：oxford)

专利内容由知识产权出版社提供

专利名称：ALIGNMENT

发明人：HAMAZAKI FUMIYOSHI,IGARASHI

HAJIME,NAKAI AKIYA,AYADA NAOKI

申请号：JP6433587

申请日：19870320

公开号：JPS63232424A

公开日：19880928

摘要：PURPOSE:To enable extremely high alignment accuracy and positioning at high

speed by selecting a measured region from a region point-symmetric to the center of a

substrate with the exception of a region at the center of the substrate, measuring the

quantity of the positional displacement of an original plate and the substrate in the

selected region and positioning the original plate and the substrate.

CONSTITUTION:When an original plate such as a mask, a reticle, etc., and a substrate such

as a semiconductor wafer are positioned in an exposure device as a semiconductor

production unit, a measured region is selected from a region point-symmetric to the

center of the substrate with the exception of a region at the center of the substrate, and

the quantity of the positional displacement of the original plate and the substrate in the

selected region on the substrate is measured through a TTL (Through The Lens) system

and the original plate and the substrate are positioned. The region point-symmetric to

the center of the substrate is used as the object region of measurement, thus accurately

calculating the central position of the substarte, then eliminating the need for

measurement in the region at the center of the substrate.

申请人：CANON INC

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