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2024年12月28日发(作者：ps剪切一寸照片插件)

专利内容由知识产权出版社提供

专利名称：Alignment apparatus

发明人：Kenji Nishi

申请号：US07/123335

申请日：19871120

公开号：US04794426A

公开日：19881227

摘要：An apparatus for optically aligning a first mark of a substrate and a second

mark of a mask formed by a member transmitting radiation therethrough and a member

intercepting the radiation includes a stage for supporting the substrate thereon, moving

means for two- dimensionally moving the stage, a projection optical system for

projecting the pattern of the mask onto the substrate supported on the stage, mark

detecting means for optically detecting the first and second marks, the mark detecting

means having first application means for applying radiation to the first mark of the

substrate through the mask, second application means for applying radiation to the

second mark of the mask through the projection optical system, an objective optical

system for forming the images of the first and second marks on a predetermined surface,

and an optical member. Control means for detecting the deviation between the image of

the first mark and the optical member on the basis of the first radiation detection signal

to produce a first deviation detection signal, detecting the deviation between the image

of the second mark and the optical member on the basis of the second radiation

detection signal to produce a second deviation detection signal, and controlling the

moving means on the basis of the first and second detection signals.

申请人：NIKON CORPORATION

代理机构：Shapiro and Shapiro

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