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2024年12月28日发(作者：java中arraylist对比)

专利内容由知识产权出版社提供

专利名称：SUBSTRATE SUPPORT DISC

发明人：YAMAMOTO SUMIMASA,山本 純正,KUBO

HIROYOSHI,久保 博義

申请号：JP特願平4-38624

申请日：19920129

公开号：JP特開平5-205997A

公开日：19930813

专利附图：

摘要：PURPOSE:To prevent the disused part of resist from being exposed to light and

both an alignment and a focusing operation from deteriorating in accuracy due to the

reflection of light transmitted through a wafer. CONSTITUTION:A wafer chuck C1 enables

the support faces 1b of projections 1a provided to the surface of a main body 1 to suck

and support a wafer (not shown in figure). The surface of the wafer chuck C1 confronting

the rear of the wafer is covered with a first covering layer 2 of low reflectance. The

surface of the first covering layer 2 is roughened to scatter the reflected light. The

surface of the first covering layer 2 is covered with a transparent second covering layer 3

whose surface is smooth. Therefore, a wafer is prevented from deteriorating in evenness

due to the rugged surface of the first covering layer 2.

申请人：CANON INC,キヤノン株式会社

地址：東京都大田区下丸子3丁目30番2号

国籍：JP

代理人：阪本 善朗

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