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2024年12月28日发(作者：asp代码解密)

专利内容由知识产权出版社提供

专利名称：Exposure method and exposure apparatus

发明人：Nishi, Kenji, Intellectual Property

Department

申请号：EP01102881.8

申请日：20010214

公开号：EP1126323A2

公开日：20010822

专利附图：

摘要：An exposure apparatus for exposing a substrate with an exposure light beam

passing through a mask comprises a movable stage for moving the substrate, a stage

chamber for accommodating the movable stage, a transport system for transporting the

substrate into the stage chamber, and a first alignment system for performing positional

adjustment for the substrate with respect to the movable stage in the stage chamber.

The position of an exposure objective delivered from the transport system into the stage

chamber can be subjected to positional adjustment by using the first alignment system.

The stage chamber and the movable stage can be assembled to a frame of the exposure

apparatus in accordance with the module system. The exposure apparatus includes a

second alignment system for performing positional adjustment for the substrate

installed on the movable stage at an exposure position.

申请人：Nikon Corporation

地址：Fuji Building, 2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo 100-8331 JP

国籍：JP

代理机构：HOFFMANN - EITLE

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