admin 管理员组

文章数量: 1086019


2024年12月28日发(作者：时而安静时而活泼英文)

专利内容由知识产权出版社提供

专利名称：Exposure mask, exposure mask substrate,

method for fabricating the same, and

method for forming pattern based on

exposure mask

发明人：Shinichi Ito,Haruo Okano,Toru

Watanabe,Katsuya Okumura

申请号：US08/471782

申请日：19950606

公开号：US05620815A

公开日：19970415

摘要：An exposure mask having an excellent alignment accuracy between patterns,

which is prepared by first forming on a light transmissive substrate a light shielding film

or a semi-transparent film pattern (first pattern) somewhat larger than a desired

dimension, forming thereon a semi-transparent film or a light transmissive film pattern

(second pattern) so as to include all patterns of the desired dimensions made up of a

light shielding part, a semi-transparent part and a light transmissive part, and then

removing a projected part of the first pattern with use of the second pattern as a mask.

The semi-transparent film is formed of at least two layers each of which contains a

common element, thus the semi-transparent film can be made with use of the same

apparatus and when patterning, etching process can be carried out with use of the same

etchant.

Further, since in a mask including the semi-transparent pattern, at least that area of a

non-pattern zone where light reaches a wafer through the transfer, acts to shield the

exposure light, too narrowed pattern or insufficient focal depth can be prevented.

申请人：KABUSHIKI KAISHA TOSHIBA

代理机构：Finnegan, Henderson, Farabow, Garrett & Dunner, LP.

更多信息请下载全文后查看


本文标签： 专利 全文 下载 知识产权 出版社

版权声明：本文标题：Exposure mask, exposure mask substrate, method for 内容由网友自发贡献，该文观点仅代表作者本人， 转载请联系作者并注明出处：http://www.roclinux.cn/p/1735413477a1660758.html， 本站仅提供信息存储空间服务，不拥有所有权，不承担相关法律责任。如发现本站有涉嫌抄袭侵权/违法违规的内容，一经查实，本站将立刻删除。