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2024年12月28日发(作者:php limit)

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专利名称:Substrate processing pallet and related

substrate processing method and machine

发明人:Martin P. Klein,David Felsenthal,Piero

Sferlazzo

申请号:US09917224

申请日:20010727

公开号:US06821912B2

公开日:20041123

专利附图:

摘要:A substrate processing pallet has a top surface and a plurality of side surfaces.

The top surface has at least one recess adapted to receive a substrate. The recess

includes a support structure adapted to contact a portion of a substrate seated in the

recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can

extend through the apertures initially to support the substrate and retract to deposit

the substrate onto the support structure. A side surface includes a process positioning

feature adapted to engage with a feature located in a process chamber to position the

pallet. A side surface includes a positioning feature adapted to engage with an end

effector alignment feature to position the pallet with respect to the end effector during

transport. A side surface includes support features adapted to engage with end effector

support features to support the pallet during transport.

申请人:NEXX SYSTEMS PACKAGING, LLC

代理机构:Proskauer Rose LLP

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