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2024年12月28日发(作者：普吉华怎么吃)

专利内容由知识产权出版社提供

专利名称：Substrate processing and method of

manufacturing device

发明人：Kazuyuki Toyoda,Nobuhito Shima,Nobuo

Ishimaru,Yoshikazu Konno,Motonari

Takebayashi,Takaaki Noda,Norikazu Mizuno

申请号：US10547320

申请日：20040304

公开号：US2A1

公开日：20061123

专利附图：

摘要：A substrate processor enables realization of a proper process by combining

advantages of a remote plasma and a plasma generated in an entire processing chamber.

The substrate processor includes a conductive member () which is installed surrounding a

processing space () and grounded to the earth and a pair of electrodes () installed inside

the conductive member (). A primary coil of an insularing transformer () is connected to a

high-frequency power supply unit () and a secondary coil is connected to the electrodes

(). A switch () is connected to the connection line connecting the secondary coil to the

electrodes (). By setting up/cutting off the connection of the line to the earth with use of

the switch (), the region where the plasma is generated in the processing space () can be

changed.

申请人：Kazuyuki Toyoda,Nobuhito Shima,Nobuo Ishimaru,Yoshikazu Konno,Motonari

Takebayashi,Takaaki Noda,Norikazu Mizuno

地址：Toyama-shi JP,Tokyo JP,Tokyo JP,Tokyo JP,Tokyo JP,Tokyo JP,Tokyo JP

国籍：JP,JP,JP,JP,JP,JP,JP

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