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2024年12月28日发(作者：osi七层模型中每一层的主要功能)

专利内容由知识产权出版社提供

专利名称：Substrate processing system, substrate

processing method, and storage medium

发明人：Tsuyoshi Moriya,Kazuya Nagaseki

申请号：US11671821

申请日：20070206

公开号：US07654010B2

公开日：20100202

专利附图：

摘要：A substrate processing method for a substrate processing system comprising

at least a substrate processing apparatus that subjects a substrate to processing, and a

substrate transferring apparatus having a transferring device that transfers the

substrate, which enables the yield to be increased without bringing about a decrease in

the throughput. The substrate processing method comprises a jetting step of jetting a

high-temperature gas onto at least one of the transferring device and the substrate

transferred by the transferring device.

申请人：Tsuyoshi Moriya,Kazuya Nagaseki

地址：Nirasaki JP,Nirasaki JP

国籍：JP,JP

代理机构：Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.

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