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2024年12月28日发(作者:免费在线文字转换器)
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专利名称:SUBSTRATE CLEANING APPARATUS,
SUBSTRATE CLEANING METHOD AND
COMPUTER STORAGE MEDIUM
发明人:SUGIMACHI, Hisanori,MATSUDA, Yoshitaka
申请号:JP2009051251
申请日:20090127
公开号:WO09/096380P1
公开日:20090806
摘要:Provided is a substrate cleaning apparatus for cleaning a rear surface of a
substrate prior to exposing the substrate. The substrate cleaning apparatus is provided
with a processing container having a carry in/out port for carrying in and out the
substrate; a transfer mechanism, which holds an outer circumference section of the
substrate and carries in and out the substrate to and from the processing container; a
gas jetting nozzle which jets a gas to the rear surface of the substrate held by the
transfer mechanism in the processing container; an electrostatically chargeable member
which can be electrostatically charged for capturing, in theprocessing container by static
electricity, adhered materials on the rear surface of the substrate held by the transfer
mechanism; and an exhaust mechanism for exhausting atmosphere in the processing
container. Thus, the rear surface of the substrate can be entirely cleaned efficiently prior
to exposure.
申请人:SUGIMACHI, Hisanori,MATSUDA, Yoshitaka
地址:JP,JP,JP
国籍:JP,JP,JP
代理机构:KANEMOTO, Tetsuo
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