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2024年12月28日发(作者:免费在线文字转换器)

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专利名称:SUBSTRATE CLEANING APPARATUS,

SUBSTRATE CLEANING METHOD AND

COMPUTER STORAGE MEDIUM

发明人:SUGIMACHI, Hisanori,MATSUDA, Yoshitaka

申请号:JP2009051251

申请日:20090127

公开号:WO09/096380P1

公开日:20090806

摘要:Provided is a substrate cleaning apparatus for cleaning a rear surface of a

substrate prior to exposing the substrate. The substrate cleaning apparatus is provided

with a processing container having a carry in/out port for carrying in and out the

substrate; a transfer mechanism, which holds an outer circumference section of the

substrate and carries in and out the substrate to and from the processing container; a

gas jetting nozzle which jets a gas to the rear surface of the substrate held by the

transfer mechanism in the processing container; an electrostatically chargeable member

which can be electrostatically charged for capturing, in theprocessing container by static

electricity, adhered materials on the rear surface of the substrate held by the transfer

mechanism; and an exhaust mechanism for exhausting atmosphere in the processing

container. Thus, the rear surface of the substrate can be entirely cleaned efficiently prior

to exposure.

申请人:SUGIMACHI, Hisanori,MATSUDA, Yoshitaka

地址:JP,JP,JP

国籍:JP,JP,JP

代理机构:KANEMOTO, Tetsuo

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