admin 管理员组

文章数量: 1086019


2024年12月28日发(作者：免费在线文字转换器)

专利内容由知识产权出版社提供

专利名称：SUBSTRATE CLEANING APPARATUS,

SUBSTRATE CLEANING METHOD AND

COMPUTER STORAGE MEDIUM

发明人：SUGIMACHI, Hisanori,MATSUDA, Yoshitaka

申请号：JP2009051251

申请日：20090127

公开号：WO09/096380P1

公开日：20090806

摘要：Provided is a substrate cleaning apparatus for cleaning a rear surface of a

substrate prior to exposing the substrate. The substrate cleaning apparatus is provided

with a processing container having a carry in/out port for carrying in and out the

substrate; a transfer mechanism, which holds an outer circumference section of the

substrate and carries in and out the substrate to and from the processing container; a

gas jetting nozzle which jets a gas to the rear surface of the substrate held by the

transfer mechanism in the processing container; an electrostatically chargeable member

which can be electrostatically charged for capturing, in theprocessing container by static

electricity, adhered materials on the rear surface of the substrate held by the transfer

mechanism; and an exhaust mechanism for exhausting atmosphere in the processing

container. Thus, the rear surface of the substrate can be entirely cleaned efficiently prior

to exposure.

申请人：SUGIMACHI, Hisanori,MATSUDA, Yoshitaka

地址：JP,JP,JP

国籍：JP,JP,JP

代理机构：KANEMOTO, Tetsuo

更多信息请下载全文后查看


本文标签： 专利 全文 下载 知识产权

版权声明：本文标题：SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING 内容由网友自发贡献，该文观点仅代表作者本人， 转载请联系作者并注明出处：http://www.roclinux.cn/p/1735442857a1664870.html， 本站仅提供信息存储空间服务，不拥有所有权，不承担相关法律责任。如发现本站有涉嫌抄袭侵权/违法违规的内容，一经查实，本站将立刻删除。