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2024年12月28日发(作者：mvc模式适用于以下哪种情况)

专利内容由知识产权出版社提供

专利名称：IMPRINT APPARATUS AND METHOD FOR

PRODUCING ARTICLE

发明人：Yousuke Kondo

申请号：US15362568

申请日：20161128

公开号：US2A1

公开日：20170608

专利附图：

摘要：An imprint apparatus, to perform an imprinting process for bringing a mold and

an imprint material on a substrate into contact with each other and curing the imprint

material, includes a substrate deforming mechanism and a controller. The substrate

deforming mechanism deforms the substrate in such a manner that a surface geometry

of at least part of the substrate protrudes toward the mold. The controller determines a

condition for the imprinting process on a shot area of the substrate based on the surface

geometry of the shot area when the mold is brought into contact with the imprint

material on the shot area.

申请人：CANON KABUSHIKI KAISHA

地址：Tokyo JP

国籍：JP

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