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2024年12月28日发(作者：手机怎么做vbs代码)

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专利名称：PLASMA PROCESSING APPARATUS AND GAS

EXHAUST METHOD

发明人：YAMASHITA, Jun

申请号：JP2008067296

申请日：20080925

公开号：WO09/041499P1

公开日：20090402

摘要：A plasma processing apparatus is provided for performing plasma processing

to a substrate to be processed. The plasma processing apparatus is provided with a

processing container (2) which forms an internal space (15); a substrate placing table (3)

arranged in the internal space (15) for placing the substrate (W); a processing space

forming member (16), which is arranged in the internal space (15), has the inner diameter

(a1) smaller than the inner diameter (a15) of the internal space (15), and partitions a

processing space (1) above the substrate placing table (3) for performing plasma

processing; and an exhaust port (6) arranged between an upper end portion (16a) of the

processing space forming member (16) and an inner wall (15a) of the internal space (15)

for exhausting gas from the processing space (1).

申请人：YAMASHITA, Jun

地址：3-1, Akasaka 5-chome, Minato-ku, Tokyo 1076325 JP,c/o TOKYO ELECTRON AT

LIMITED, 1-8, Fuso-cho, Amagasaki-shi, Hyogo 6600891 JP

国籍：JP,JP

代理机构：TAKAYAMA, Hiroshi

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