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2024年12月29日发(作者：html输入密码进入页面)

专利内容由知识产权出版社提供

专利名称：IMPRINT APPARATUS, IMPRINT METHOD,

AND ARTICLE MANUFACTURING METHOD

发明人：KITAYAMA, Fumiaki

申请号：JP2016/003329

申请日：20160714

公开号：WO2017/010102A1

公开日：20170119

专利附图：

摘要：An imprint apparatus cures an imprint material supplied onto a substrate held

by a substrate holder by bringing a mold held by a mold holder into contact with the

imprint material. The imprint apparatus includes an adjuster to adjust a distance between

the substrate holder and the mold holder for contact and separation between the

imprint material and the mold, an energy supply tool to supply, to the imprint material,

energy for curing the imprint material supplied onto the substrate held by the substrate

holder, and a controller to control the adjuster and the energy supply tool. The

controller controls the adjuster so as to start separation between the imprint material

and the mold in a period during which the energy supply tool supplies the energy to the

imprint material that is in contact with the mold.

申请人：CANON KABUSHIKI KAISHA

地址：〒1468501 JP

国籍：JP

代理人：OHTSUKA, Yasunori et al.

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