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2024年12月29日发(作者：ppt模板免费下载网站公司)

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专利名称：EXPOSURE APPARATUS AND METHOD FOR

MANUFACTURING DEVICE

发明人：MIZUTANI, Hideo,MAGOME, Nobutaka

申请号：EP03777406.4

申请日：20031209

公开号：EP1571699A1

公开日：20050907

专利附图：

摘要：An exposure apparatus, wherein an exposure of a substrate (P) is carried out by

filling at least a portion of the space between a projection optical system and the

substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) via

the projection optical system and the liquid, includes a bubble detector (20) which

detects air bubble or bubbles in the liquid between the projection optical system and the

substrate (P). Consequently, the exposure apparatus is capable of suppressing

deterioration of a pattern image caused by bubbles in the liquid when an exposure is

carried out while filling the space between the projection optical system and the

substrate with the liquid.

申请人：NIKON CORPORATION

地址：Fuji Building, 2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo 100-8331 JP

国籍：JP

代理机构：HOFFMANN EITLE

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