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2024年12月28日发(作者：做外贸网站哪家公司好)

专利内容由知识产权出版社提供

专利名称：Substrate manufacturing method, mask

blank substrate manufacturing method,

mask blank manufacturing method, transfer

mask manufacturing method, and substrate

manufacturing apparatus

发明人：折原 敏彦,笑喜 勉

申请号：JP2018018978

申请日：20180206

公开号：JP6577071B2

公开日：20190918

摘要：PROBLEM TO BE SOLVED: To provide a method of producing a substrate which

enables production of a substrate low in occurrence of defects and high in smoothness, a

method of producing a substrate for a mask blank, a method of producing a mask blank,

a method of producing a mask for transfer and a substrate production

ON: A method of producing a substrate comprises bringing a

processing reference surface of a catalytic substance into contact with the main surface

of a substrate composed of a material containing an oxide in a state where a processing

fluid intervene between the main surface and the processing reference surface and

processing the main surface by catalyst reference etching while causing the main surface

and the processing reference surface to move relatively. The processing reference

surface is a porous surface, and a catalytic substance is formed on the porous surface.

申请人：ＨＯＹＡ株式会社

地址：東京都新宿区西新宿六丁目１０番１号

国籍：JP

代理人：押野 宏,大島 孝文

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