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2024年12月28日发(作者:deepin linux系统安装教程)

专利内容由知识产权出版社提供

专利名称:The method of manufacturing an electronic

device and a method of manufacturing a

semiconductor device

发明人:美濃 規央,竹内 孝之,北岡 康夫

申请号:JP2008520591

申请日:20070605

公开号:JPWO2007142238A1

公开日:20091029

专利附图:

摘要: Production method of the present invention is a method of manufacturing a

semiconductor device including a semiconductor layer containing crystals of the organic

semiconductor material. The manufacturing method includes forming a frame 12 (i)

substrate (base material) 11, and forming a semiconductor layer (crystal 13) to the inside

(ii) the frame 12. Step (ii) comprises crystal forming step was placed inside the frame 12

(liquid), forming crystals from a solution 13 21 21 solution and a liquid medium and an

organic semiconductor material.

申请人:パナソニック株式会社

地址:大阪府門真市大字門真1006番地

国籍:JP

代理人:鎌田 耕一,黒田 茂

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