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2024年3月22日发(作者：甲骨文数据库认证)

专利内容由知识产权出版社提供

专利名称：Alignment mark shielding ring without

arcing defect and method for using

发明人：Chen-Fang Chung

申请号：US10143623

申请日：20020509

公开号：US06676812B2

公开日：20040113

专利附图：

摘要：An alignment mark shielding ring for use in a physical vapor deposition chamber

and a method for using the ring to avoid arcing problems on the wafer. The alignment

mark shielding ring can be constructed of a ring that has a generally L-shaped cross-

section, at least one hood portion to function as the shield for the alignment mark, at

least one alignment pin for engaging at least one alignment sleeve mounted in a lower

chamber shield for holding the alignment mark shielding ring in place. The alignment

sleeve is constructed in two halves, each having an aperture therethrough. The aperture

in the top half is larger than the aperture in the bottom half such that even when the

apertures are coated with a metal layer deposited in the PVD process, the alignment pin

does not electrically short to the lower chamber shield and thus, any possibility of arcing

is avoided.

申请人：TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

代理机构：Tung & Associates

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